Microelectromechanical systems
31 Mar 2016



MEMS Target Fabrication




Target Fabrication has the capabilitity to do a number of MEMS processes. Targets are produced using silicon wafer based etching techniques and are ideal for:

  • Large numbers of targets for high-repetition rate experiments - usually as arrays
  • Targets with micro and nano scale dimensions not possible with other fabrication techniques
  • Target types include: micro-dot, multi-vane and ultra-low mass targets, thin foil assemblies and grating structures

MEMS Target section
MEMS Target array
Close-up of individual Target​

Contact: Haddock, David (STFC,RAL,CLF)