Target Fabrication has the capability to deposit a variety of thin film materials from tens of atoms thick up to many microns.
Capabilities include:
![Thin film gold](/Gallery/Thin%20film%20gold.jpg)
Thin Film Gold Coating
Thermal Evaporation
Vaporisation and condensing of a material under vacuum by way of resistive heating. Ideal for low melting point metals such as Aluminium in thicknesses 10nm-1000nm
Electron-Beam Evaporation
Principally the same as Thermal Evaporation, however the material to be deposited is heated directly by a focused beam of electrons. This allows for deposition of exotic materials with higher melting points such as Gadolinium, Zirconium and Potassium Bromide.
![Plasma Sputter coating plant](/Gallery/Plasma%20in%20TFab%20Sputter.jpg)
Plasma created by Splasma Sputter Coating plant
Plasma Sputtering
Particles are ejected from a solid target by way of bombardment by energetic Argon ions. Target Fabrication has the capability to do co-deposits, two separate materials deposited concurrently. This allows for two contrasting Z-materials to be equally dispersed throughout a material
Parylene Coating
Plastics can be coated by way of Chemical Vapour Deposition. Produces a thin a low atomic number material (hydrocarbon) that is strong at thicknesses as low as 100 nanometres. Chlorinated plastics can also be coated by this technique.
Diamond-Like Carbon (DLC)
An amorphous carbon film with the material properties of diamond. The resulting coating is excellent for ultra-thin laser targets as thin as five nanometres.